KAYAKU SU8 photoresist developer containing PEGMA methyl methacrylate polyethylene glycol monoester Microchem

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KAYAKU SU8 photoresist developer containing PEGMA methyl methacrylate polyethylene glycol monoester Microchem

$1.53

Reference Price

1bottle (Min. Order)

Microchem (KAYAKU) photoresist developer solution

SU8 photoresist developer solution

Negotiable

Ship From

Suzhou, Jiangsu

Shipping

To be negotiated with the supplier

Customization

For customization requests, please

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Price Disclaimer

Brand

Microchem(KAYAKU)

Product Name

SU8 photoresist developer solution

Packaging specification

1L/bottle

Model number

SU-8Developer

Is it imported

Yes

Processing & Customization

Yes

Packaging specification

1kg

Photoresist model 1

SU82000.5

Photoresist model 2

SU-82002

Photoresist model 3

SU82005

Photoresist model 4

SU82007

Photoresist model 5

SU82010

Photoresist model 6

SU82015

type

developer

Development time

Refer to the instruction manual

Place of Dispatch

Suzhou

Recommended lithography machine model

Cchip-0019 Lithography Machine

Details

Price Disclaimer

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