High aspect ratio UV lithography machine - Exposure machine Cchip0019 for photoresist SU8 exposure

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High aspect ratio UV lithography machine - Exposure machine Cchip0019 for photoresist SU8 exposure

$14.38

Reference Price

1platform (Min. Order)

UV exposure machine

Cchip-0019

Negotiable

Ship From

Suzhou, Jiangsu

Shipping

To be negotiated with the supplier

Customization

For customization requests, please

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Price Disclaimer

Brand

SMIC Qiheng

Exposure area

110mm×110mm

Exposure wavelength

365nm:40mW/cm2

resolution

0.8μm

Scanning range of microscope

X:±50mm,Y:±20mm

alignment accuracy

±0.5μm

Reticle Size

3 inches, 4 inches, 5 inches

Sample size

2-inch, 3-inch, 4-inch

Thickness ranging from 0.1mm to 5m

exposure method

Timer (countdown mode)

Uneven illumination

2% (within a range of 100mm)

The motion stroke of the mask relative to the sample

X:±5mm,Y:±5mm

Exposure light source

UV LED

Exposure intensity

40mW

Maximum adhesive thickness

350μm

Parallelism of light source

<1.8°

Place of Dispatch

Suzhou

Implementation Standard

ISO9001 Quality Management System

after-sales service

24 hours

Packaging specification

1 unit/box

Details

Price Disclaimer

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