8-inch inductively coupled plasma atomic layer deposition system (PEALD)

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Attributes

8-inch inductively coupled plasma atomic layer deposition system (PEALD)

$negotiable / platform

Reference Price

1platform (Min. Order)

Ship From

Shenzhen, Guangdong

Shipping

To be negotiated with the supplier

Customization

For customization requests, please

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Innovative laboratory packaging machine suitable for various industries with stable performance

Brand

brand name

type

Atomic layer deposition system

Scope of application

Focusing on the research and application of atomic layer deposition technology

Voltage

According to the specific configuration of the device

sealing form

Anti corrosion design

pipe number

Route 6

Does it support customized processing

Yes

connection type

Independent temperature control

Scope of application

Deposition of optical anti reflection film, anti reflection layer, etc

work ability

Support multiple substrates and precursors

Applicable Machinery

Optional vacuum robotic arm and dual chamber preheating module

production capacity

efficient

Equipment type

Automated equipment

kind

Machinery and equipment

volume

Based on equipment design

Applicable materials

AlF3, MgF2, CaF2, LiF, etc

Is it imported

Model number

Model of Atomic Layer Deposition System

Inner pot size

Customize according to device specifications

Material

Compatible with multiple materials

Details

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